Non-Destructive Three-Dimensional Visualization of High-Aspect-Ratio Etched Holes Achieved —Structural Evaluation Technology Contributing to the Development of Next-Generation 3D NAND Flash Memory—

A research group led by Mr. Naru Okawa, a graduate student at the Graduate School of Engineering, Tohoku University, and Professor Yukio Takahashi of the Synchrotron Radiation Instrumentation Research Center (SRIS), has successfully achieved non-destructive three-dimensional visualization of high-aspect-ratio etched holes by combining X-ray ptychography with computed tomography (CT) using the high-brightness tender X-rays available at beamline BL10U of NanoTerasu, the 3 GeV Advanced Synchrotron Radiation Facility.

This technique enables detailed, non-destructive observation of the three-dimensional internal structure of high-aspect-ratio etched holes, which are essential components in next-generation 3D NAND flash memory devices, and is expected to contribute to the development of advanced structural evaluation methods for semiconductor manufacturing.

Tohoku University Press Release (Tohoku University website):
https://www.tohoku.ac.jp/japanese/2026/07/press20260709-02-EtchedHoles.html